25th Conference on Ion Implantation and Annealing Technology (IIT)

Advanced Equipment for Ion Implantation, Annealing, and Metrology, such as • Tools for ion implantation, plasma doping, and thermal annealing • Metrology equipment for implantation control • AI and machine learning for equipment and process optimization Ion Implantation and Annealing Technology of Semiconductor and Non-Semiconductor Materials, such as • Ion implantation and annealing of Si, SiC, GaN and other materials • Surface modification by annealing techniques and ion implantation • New doping techniques • Layer transfer Device Technology and Applications for Ion Implantation and Annealing, such as • Power and RF devices • MEMS, chemical and physical sensors • Emerging CMOS, 3D memories • Photonic devices • Nano-scale device fabrication for quantum technology Modeling, Simulation and Metrology of Ion Implantation and Annealing, such as • Defect generation due to ion irradiation in substrates and its annealing • Surface modification and strategies for defect mitigation

With technical sponsorship from IEEE, this event anticipates that its proceedings will be indexed in leading databases such as Scopus, Web of Science (WoS), Ei Compendex, DBLP, and Google Scholar.